| سال | هفته | ID | Title | ApplNo | IPC | Applicant | Subgroup | زیر گروه | رشته | شرح | Description |
|---|
2026 | 05 | WO/2026/021243 | SEMICONDUCTOR PROCESSING APPARATUS | CN2025/107050 | H01J 37/32 | BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD. | ELECTRICITY | الکتریسیته | دانش هسته ای | 2026 | 05 | WO/2026/022096 | ION BEAM FILTERING | EP2025/070879 | H01J 49/28 | NU INSTRUMENTS LIMITED | ELECTRICITY | الکتریسیته | دانش هسته ای | 2026 | 05 | WO/2026/022997 | CHARGED PARTICLE BEAM SYSTEM AND OPTICAL AXIS ADJUSTMENT METHOD | JP2024/026552 | H01J 37/04 | HITACHI HIGH-TECH CORPORATION | ELECTRICITY | الکتریسیته | دانش هسته ای | 2026 | 05 | WO/2026/023005 | DATASET GENERATION DEVICE, DATASET GENERATION METHOD, IMAGING DEVICE, IMAGING METHOD, MICROSCOPE DEVICE, DATASET GENERATION SYSTEM, IMAGING SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM | JP2024/026566 | H01J 37/22 | HITACHI HIGH-TECH CORPORATION | ELECTRICITY | الکتریسیته | دانش هسته ای | 2026 | 05 | WO/2026/024120 | PLASMA PROCESSING APPARATUS | KR2025/011013 | H01J 37/32 | PLASMAPP CO., LTD. | ELECTRICITY | الکتریسیته | دانش هسته ای | 2026 | 05 | WO/2026/024275 | DIODE-BASED RADIO FREQUENCY (RF) MATCHING NETWORK WITH MULTILEVEL PLASMA IMPEDANCE MATCHING | US2024/039227 | H01J 37/32 | APPLIED MATERIALS, INC. | ELECTRICITY | الکتریسیته | دانش هسته ای | 2026 | 05 | WO/2026/024604 | BARRIER SEALS FOR SEGMENTED ELECTRODES WITH FLOATING SEGMENTS | US2025/038433 | H01J 37/32 | LAM RESEARCH CORPORATION | ELECTRICITY | الکتریسیته | دانش هسته ای |